Structural and Properties of BiFeO<sub>3</sub> Thin Film Using a Chemical Solution Deposition Method

CHEN Ruqi; ZHU Guiwen; XU Chudong

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Structural and Properties of BiFeO₃ Thin Film Using a Chemical Solution Deposition Method

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- Structural and Properties of BiFeO₃ Thin Film Using a Chemical Solution Deposition Method
- Acta Scientiarum Naturalium Universitatis SunYatseni Vol. 54, Issue 1, Pages: 79-83(2015)
- 作者机构：
  
  1. ．华南农业大学公共基础课实验教学中心,广东,广州,510642
  2. 
  3. 广东药学院基础学院物理与电子学教研室,广东,广州,510006
- 作者简介：
- 基金信息：
- DOI：
  CLC：
- Published：2015，
  
  Published Online：25 January 2015，
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CHEN Ruqi, ZHU Guiwen, XU Chudong. Structural and Properties of BiFeO₃ Thin Film Using a Chemical Solution Deposition Method. [J]. Acta Scientiarum Naturalium Universitatis SunYatseni 54(1):79-83(2015)
DOI：

CHEN Ruqi, ZHU Guiwen, XU Chudong. Structural and Properties of BiFeO₃ Thin Film Using a Chemical Solution Deposition Method. [J]. Acta Scientiarum Naturalium Universitatis SunYatseni 54(1):79-83(2015) DOI：

摘要

采用化学溶液沉积法在ITO玻璃基片上制备铁酸铋BiFeO

薄膜。薄膜呈纯钙钛矿结构，无杂相生成。此外，薄膜表面光滑致密、没有微裂痕。薄膜得到的晶粒尺寸较小，约为45 nm。在550 ℃ 1 h退火的薄膜有良好的电学特性，在1 kHz频率下测得的相对介电常数、损耗因子分别约为198、3%；此外，在760 kV/cm 电场驱动下，薄膜得到的剩余极化（2P

）约为25 μC/cm

矫顽电场（2E

）约为650 kV/cm。BFO薄膜在550 ℃退后，通过吸收光谱分析得到BFO薄膜的光学带隙为2.7 eV。这些结果表明，退火温度550 ℃ 制备的BiFeO

固溶体薄膜具有较好的性能，有望成为光电器件的候选材料。

Abstract

BiFeO

(BFO) thin films were prepared on ITO glass substrates using a chemical solution deposition method. The thin films exhibited pure perovskite structure

no secondary phase was observed. Meanwhile

they were smooth

dense and crack-free with small grain size of about 45 nm. Good electrical properties were observed in the films annealed at 550 ℃ for 1 h. The relative permittivity and the dissipation factor (at 1 kHz) were 198 and 3%

respectively. Driven by a electric field of 760 kV/cm

BFO showed 2P

of 25 μC/cm

and 2E

of 650 kV/cm. The optical band gap of BFO thin films was 2.7 eV. These results indicated that the BFO thin films annealed at 550 ℃ had excellent properties and they had potentials in opticoelectric devices.

关键词

化学溶液沉积法BiFeO3相对介电常数损耗因子光学带隙

Keywords

chemical solution deposition methodBFOrelative permittivitydielectric lossoptical band gap

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Related Author

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Center of Experimental Teaching for Common Basic Courses, South China Agricultural University

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Structural and Properties of BiFeO3 Thin Film Using a Chemical Solution Deposition Method

DOI：

摘要

Abstract

关键词

Keywords

references

Structural and Properties of BiFeO₃ Thin Film Using a Chemical Solution Deposition Method